MAPPER and TSMC Take Next Step in Exploring Multiple E-beam Lithography for IC Manufacturing at 22 nanometer node and Beyond.

MAPPER Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) signed an agreement, according to which MAPPER will ship its first 300 mm multiple-electron-beam maskless lithography platform for process development and device prototyping to TSMC. This platform gives TSMC the opportunity to take the next step forward in exploring multiple e-beam technology as a lithography option at 22 nanometer and more advanced process nodes.

為什麼要介紹這簡公間??除了MAPPER與台積電有合作之外

更重要的MAPPER這台曝光機器是採用MEMS技術製造的，採用多重電子束曝光技術

FROM HERE

http://www.mapperlithography.com/index.html